Thiele, C and Thiele, C and Felten, A and Felten, A and Echtermeyer, TJ and Ferrari, AC and Casiraghi, C and Casiraghi, C and V Löhneysen, H and V Löhneysen, H and V Löhneysen, H and Krupke, R and Krupke, R and Krupke, R (2013) Electron-beam-induced direct etching of graphene. Carbon, 64. pp. 84-91. ISSN 0008-6223Full text not available from this repository.
We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. © 2013 Elsevier Ltd. All rights reserved.
|Depositing User:||Cron job|
|Date Deposited:||16 Jul 2015 13:40|
|Last Modified:||31 Aug 2015 07:28|