CUED Publications database

Electron-beam-induced direct etching of graphene

Thiele, C and Felten, A and Echtermeyer, TJ and Ferrari, AC and Casiraghi, C and V Löhneysen, H and Krupke, R (2013) Electron-beam-induced direct etching of graphene. Carbon, 64. pp. 84-91. ISSN 0008-6223

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Abstract

We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. © 2013 Elsevier Ltd. All rights reserved.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 12:10
Last Modified: 08 Dec 2014 02:17
DOI: 10.1016/j.carbon.2013.07.038