Thiele, C and Felten, A and Echtermeyer, TJ and Ferrari, AC and Casiraghi, C and V Löhneysen, H and Krupke, R (2013) Electron-beam-induced direct etching of graphene. Carbon, 64. pp. 84-91. ISSN 0008-6223Full text not available from this repository.
We present electron-beam-induced oxidation of single- and bilayer graphene devices in a low-voltage scanning electron microscope. We show that the injection of oxygen leads to targeted etching at the focal point, enabling us to pattern graphene with a resolution of better than 20 nm. Voltage-contrast imaging, in conjunction with finite-element simulations, explain the secondary-electron intensities and correlate them to the etch profile. © 2013 Elsevier Ltd. All rights reserved.
|Divisions:||Div B > Solid State Electronics and Nanoscale Science|
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|Date Deposited:||09 Dec 2016 17:23|
|Last Modified:||29 Mar 2017 23:20|