CUED Publications database

Demonstration of submicron square-like silicon waveguide using optimized LOCOS process

Desiatov, B and Goykhman, I and Levy, U (2010) Demonstration of submicron square-like silicon waveguide using optimized LOCOS process. Optics Express, 18. pp. 18592-18597.

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Abstract

We demonstrate the design, fabrication and experimental characterization of a submicron-scale silicon waveguide that is fabricated by local oxidation of silicon. The use of local oxidation process allows defining the waveguide geometry and obtaining smooth sidewalls. The process can be tuned to precisely control the shape and the dimensions of the waveguide. The fabricated waveguides are measured using near field scanning optical microscope at 1550 nm wavelength. These measurements show mode width of 0.4 μm and effective refractive index of 2.54. Finally, we demonstrate the low loss characteristics of our waveguide by imaging the light scattering using an infrared camera. © 2010 Optical Society of America.

Item Type: Article
Uncontrolled Keywords: Finite Element Analysis Light Microscopy Microscopy, Electron, Scanning Models, Theoretical Optics and Photonics Oxides Refractometry Scattering, Radiation Silicon Silicon Dioxide
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:13
Last Modified: 13 Apr 2021 07:47
DOI: 10.1364/OE.18.018592