CUED Publications database

Numerical study of the impact of process variations on the motional resistance of weakly coupled MEMS resonators

Erbes, A and Thiruvenkatanathan, P and Seshia, AA (2013) Numerical study of the impact of process variations on the motional resistance of weakly coupled MEMS resonators. 2013 Joint European Frequency and Time Forum and International Frequency Control Symposium, EFTF/IFC 2013. pp. 674-677.

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Abstract

This paper presents a numerical study of the impact of process-induced variations on the achievable motional resistance R x of one-dimensional, cyclic and cross-coupled architectures of electrostatically transduced MEMS resonators operating in the 250 kHz range. Monte Carlo numerical simulations which accounted for up to 0.75% variation in critical resonator feature sizes were initiated on 1, 2, 3, 4, 5 and 9 coupled MEMS resonators for three distinct coupling architectures. Improvements of 100X in the spread of R x and 2.7X in mean achievable R x are reported for the case of 9 resonators when implemented in the cross-coupled topology, as opposed to the traditional one-dimensional chain. © 2013 IEEE.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div C > Applied Mechanics
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:17
Last Modified: 10 Aug 2017 01:37
DOI: