CUED Publications database

Nucleation control for large, single crystalline domains of monolayer hexagonal boron nitride via Si-doped Fe catalysts.

Caneva, S and Weatherup, RS and Bayer, BC and Brennan, B and Spencer, SJ and Mingard, K and Cabrero-Vilatela, A and Baehtz, C and Pollard, AJ and Hofmann, S (2015) Nucleation control for large, single crystalline domains of monolayer hexagonal boron nitride via Si-doped Fe catalysts. Nano Lett, 15. pp. 1867-1875.

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Abstract

The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of ∼0.3 mm, and of continuous h-BN monolayer films with large domain sizes (>25 μm) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-film Fe/SiO2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes a basis for further rational catalyst design for compound 2D materials.

Item Type: Article
Uncontrolled Keywords: Fe catalyst Hexagonal boron nitride (h-BN) borazine (HBNH)3 chemical vapor deposition (CVD) in situ X-ray diffraction (XRD) secondary ion mass spectrometry (SIMS)
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:33
Last Modified: 23 Nov 2017 03:43
DOI: