CUED Publications database

Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD.

Caneva, S and Weatherup, RS and Bayer, BC and Blume, R and Cabrero-Vilatela, A and Braeuninger-Weimer, P and Martin, M-B and Wang, R and Baehtz, C and Schloegl, R and Meyer, JC and Hofmann, S (2016) Controlling Catalyst Bulk Reservoir Effects for Monolayer Hexagonal Boron Nitride CVD. Nano Lett, 16. pp. 1250-1261.

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Abstract

Highly controlled Fe-catalyzed growth of monolayer hexagonal boron nitride (h-BN) films is demonstrated by the dissolution of nitrogen into the catalyst bulk via NH3 exposure prior to the actual growth step. This "pre-filling" of the catalyst bulk reservoir allows us to control and limit the uptake of B and N species during borazine exposure and thereby to control the incubation time and h-BN growth kinetics while also limiting the contribution of uncontrolled precipitation-driven h-BN growth during cooling. Using in situ X-ray diffraction and in situ X-ray photoelectron spectroscopy combined with systematic growth calibrations, we develop an understanding and framework for engineering the catalyst bulk reservoir to optimize the growth process, which is also relevant to other 2D materials and their heterostructures.

Item Type: Article
Uncontrolled Keywords: ammonia (NH3) borazine (HBNH)3 chemical vapor deposition (CVD) hexagonal boron nitride (h-BN) iron (Fe) Ammonium Compounds Boron Compounds Catalysis Iron Kinetics Nanostructures Nitrogen Surface Properties X-Ray Diffraction
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 18:57
Last Modified: 22 Sep 2017 20:13
DOI: