CUED Publications database

On the origin of contact resistances in graphene devices fabricated by optical lithography

Chavarin, CA and Sagade, AA and Neumaier, D and Bacher, G and Mertin, W (2016) On the origin of contact resistances in graphene devices fabricated by optical lithography. Applied Physics A: Materials Science and Processing, 122. pp. 1-5. ISSN 0947-8396

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Abstract

© 2016, Springer-Verlag Berlin Heidelberg. The contact resistance is a key bottleneck limiting the performance of graphene-based electronic and optoelectronic devices. Using a combined approach of atomic force microscopy patterning, Kelvin probe force microscopy and micro-Raman mapping, we study the influence of optical lithography resists on the contact resistance in graphene devices. We find that devices fabricated by optical lithography show a significantly larger contact resistance compared to devices produced by electron beam lithography using polymethylmethacrylate as resist. This difference is attributed to a 3–4-nm-thick residual layer remaining in between the contact metal and the graphene after optical lithography.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:31
Last Modified: 21 Sep 2017 01:39
DOI: