CUED Publications database

Optimised atmospheric pressure CVD of monoclinic VO<inf>2</inf> thin films with picosecond phase transition

Gaskell, JM and Afzaal, M and Sheel, DW and Yates, HM and Delfanazari, K and Muskens, OL (2016) Optimised atmospheric pressure CVD of monoclinic VO<inf>2</inf> thin films with picosecond phase transition. Surface and Coatings Technology, 287. pp. 160-165. ISSN 0257-8972

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Abstract

© 2016 Elsevier B.V. Monoclinic vanadium oxide (VO 2 ) thin films with low roughness values were deposited and optimised by atmospheric pressure chemical vapour deposition using vanadium tetrachloride (VCl 4 ) and water (H 2 O). Smooth VO 2 films with good transmittance properties were successfully produced on fluorine doped tin oxide/borosilicate substrates. Systematic investigations confirmed that the quality (including phase) of films being produced strongly depended on substrate, deposition time, temperature, and precursor ratio within the process. Optical characterisation using ellipsometry revealed a strong thermochromic response of the films with a large change in the dielectric function, while time-resolved pump-probe transmission showed the picosecond nature of the phase transition.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:53
Last Modified: 16 Nov 2017 02:12
DOI: