CUED Publications database

Bulk molybdenum field emitters by inductively coupled plasma etching.

Zhu, N and Cole, MT and Milne, WI and Chen, J (2016) Bulk molybdenum field emitters by inductively coupled plasma etching. Phys Chem Chem Phys, 18. pp. 33152-33157.

Full text not available from this repository.

Abstract

In this work we report on the fabrication of inductively coupled plasma (ICP) etched, diode-type, bulk molybdenum field emitter arrays. Emitter etching conditions as a function of etch mask geometry and process conditions were systematically investigated. For optimized uniformity, aspect ratios of >10 were achieved, with 25.5 nm-radius tips realised for masks consisting of aperture arrays some 4.45 μm in diameter and whose field electron emission performance has been herein assessed.

Item Type: Article
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Div B > Electronics, Power & Energy Conversion
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 18:58
Last Modified: 14 Nov 2017 02:19
DOI: