CUED Publications database

A review of thin-film transistors/circuits fabrication with 3D self-aligned imprint lithography

Li, S and Chu, D (2017) A review of thin-film transistors/circuits fabrication with 3D self-aligned imprint lithography. Flexible and Printed Electronics, 2.

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Abstract

Nanoimprint lithography (NIL) is a promising method for the fabrication of micro/nanostructures through a simple, low-cost, and high throughput process. Imprinted 2D structure with high resolution has been demonstrated successfully for certain applications including magnetic hard disks and optical gratings. Manufacturing low-cost electronic devices that require patterned multi-layers with NIL is very challenging, particularly for those requiring different patterns. In recent years, considerable effort has been made using the self-aligned imprinting technique, opening an alternative way to develop and fabricate complementary flexible electronics. In this paper we review thin film transistor (TFT) fabrication with 3D self-aligned imprint lithography (SAIL), which enables the patterning and alignment of submicron features on meter-scale flexible substrates in the roll-to-roll configuration. The 3D SAIL solves the problem of precision interlayer registry of devices on a moving web by encoding all geometric information required for all device patterning steps into a monolithic imprinted 3D structure.

Item Type: Article
Uncontrolled Keywords: 3D imprinting self-alignment roll-to-roll thin-film transistor
Subjects: UNSPECIFIED
Divisions: Div B > Photonics
Depositing User: Cron Job
Date Deposited: 17 Jul 2017 19:58
Last Modified: 12 Oct 2017 01:47
DOI: