CUED Publications database

Electronic and atomic structure of metal-HfO2 interfaces

Tse, KY and Liu, D and Robertson, J (2010) Electronic and atomic structure of metal-HfO2 interfaces. PHYS REV B, 81. -. ISSN 1098-0121

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Item Type: Article
Uncontrolled Keywords: SCHOTTKY-BARRIER HEIGHTS EFFECTIVE WORK FUNCTION CONSTANT GATE OXIDES BAND OFFSETS SEMICONDUCTOR CONTACTS GAP STATES CERAMIC INTERFACES IMAGE INTERACTIONS FIRST-PRINCIPLES 0001 SURFACE
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 02 Sep 2016 16:35
Last Modified: 28 Sep 2016 03:53
DOI: