CUED Publications database

Electronic and atomic structure of metal-HfO2 interfaces

Tse, KY and Liu, D and Robertson, J (2010) Electronic and atomic structure of metal-HfO2 interfaces. PHYS REV B, 81. -. ISSN 1098-0121

Full text not available from this repository.
Item Type: Article
Uncontrolled Keywords: SCHOTTKY-BARRIER HEIGHTS EFFECTIVE WORK FUNCTION CONSTANT GATE OXIDES BAND OFFSETS SEMICONDUCTOR CONTACTS GAP STATES CERAMIC INTERFACES IMAGE INTERACTIONS FIRST-PRINCIPLES 0001 SURFACE
Subjects: UNSPECIFIED
Divisions: Div B > Solid State Electronics and Nanoscale Science
Depositing User: Cron Job
Date Deposited: 07 Mar 2014 11:43
Last Modified: 02 Oct 2014 03:45
DOI: 10.1103/PhysRevB.81.035325

Actions (login required)

View Item