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Electronic and atomic structure of metal-HfO2 interfaces

Tse, KY and Liu, D and Robertson, J (2010) Electronic and atomic structure of metal-HfO2 interfaces. PHYS REV B, 81. -. ISSN 1098-0121

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Item Type: Article
Uncontrolled Keywords: SCHOTTKY-BARRIER HEIGHTS EFFECTIVE WORK FUNCTION CONSTANT GATE OXIDES BAND OFFSETS SEMICONDUCTOR CONTACTS GAP STATES CERAMIC INTERFACES IMAGE INTERACTIONS FIRST-PRINCIPLES 0001 SURFACE
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron job
Date Deposited: 04 Feb 2015 22:13
Last Modified: 01 May 2015 18:33
DOI: 10.1103/PhysRevB.81.035325