CUED Publications database

Orthogonal lithography for organic electronics

Taylor, PG and Lee, JK and Zakhidov, AA and Hwang, HS and DeFranco, JA and Fong, HH and Chatzichristidi, M and Murotani, E and Malliaras, GG and Ober, CK (2010) Orthogonal lithography for organic electronics. In: UNSPECIFIED.

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Abstract

Organic electronics has recently gained attention as a new field promising cheaper, flexible, and large-scale devices. Although photolithography has proven to be a high-resolution and high-throughput patterning method with excellent registration capabilities, the emerging field of organic electronics has been largely unsuccessful in adapting this well-established method as a viable approach to patterning. Chemical compatibility issues between organic materials and the processing solvents and chemicals required by photolithography have been the main problem. This challenge has led us to identify a set of non-damaging processing solvents and to develop alternative imaging materials in order to extend photolithographic patterning methods to organic electronics. We have identified supercritical carbon dioxide and hydrofluoroether (HFE) solvents as chemically benign to organic electronic materials and which are also suitable as processing solvents. We refer to these solvents as orthogonal in that they do not substantially interact with traditional aqueous and organic solvents. Multi-layered devices are easily realized by exploiting this orthogonality property; subsequent layers are deposited and patterned without damaging or otherwise adversely affecting previously deposited underlying layers. We have designed and synthesized novel photoresists, which are processible in these benign solvents. © 2010 Copyright SPIE - The International Society for Optical Engineering.

Item Type: Conference or Workshop Item (UNSPECIFIED)
Subjects: UNSPECIFIED
Divisions: UNSPECIFIED
Depositing User: Cron Job
Date Deposited: 10 Sep 2017 20:11
Last Modified: 18 Feb 2021 18:43
DOI: 10.1117/12.848410